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产品概述:
The circular planar magnetron sputtering cathode is an international first-class product introduced, digested and absorbed by the company. It is developed in cooperation with a well-known domestic magnetic material research and development institution, and has no obvious difference from imported products.
1.1 Model: CMY150 (customized sizes);
1.2 Vacuum leak rate: <10E-9Torr L / S;
1.3 Voltage: <1000V;
1.4 Power density: 25W / cm2;
1.5 Applicable power supply: DC / Pulsed-DC / RF;
1.6 Applicable temperature: <450 ℃;
1.7 Magnetic circuit: Modular magnetic circuit, easy to replace;
1.8 installation method: CF interface, easy to install;
1.9 Cooling method: indirect water cooling;
1.10 can meet co-sputtering and vertical sputtering, and is compatible with equipment control system;
2. Follow the bezel.
2.1 Interface size: CF or Wilson interface electric baffle structure;
2.2 Sealing method: non-contact static seal;
2.3 Able to fine-tune the baffle structure and adjust the baffle angle after the sputtering source works normally;
2.4 With quick release interface, can be quickly removed and installed.
2.5 The baffle data interface is compatible with the device control system.